| Macroscopic 10-terabit–per–square-inch arrays from block copolymers with lateral order S Park, DH Lee, J Xu, B Kim, SW Hong, U Jeong, T Xu, TP Russell Science 323 (5917), 1030-1033, 2009 | 866 | 2009 |
| A simple route to highly oriented and ordered nanoporous block copolymer templates S Park, JY Wang, B Kim, J Xu, TP Russell ACS nano 2 (4), 766-772, 2008 | 254 | 2008 |
| Lateral ordering of cylindrical microdomains under solvent vapor S Park, B Kim, J Xu, T Hofmann, BM Ocko, TP Russell Macromolecules 42 (4), 1278-1284, 2009 | 140 | 2009 |
| Directed Self‐Assembly of Block Copolymers on Two‐Dimensional Chemical Patterns Fabricated by Electro‐Oxidation Nanolithography J Xu, S Park, S Wang, TP Russell, BM Ocko, A Checco Advanced Materials 22 (20), 2268-2272, 2010 | 72 | 2010 |
| Block copolymer self-assembly in chemically patterned squares J Xu, TP Russell, BM Ocko, A Checco Soft Matter 7 (8), 3915-3919, 2011 | 52 | 2011 |
| Fabrication of silicon oxide nanodots with an areal density beyond 1 teradots inch− 2 J Xu, SW Hong, W Gu, KY Lee, DS Kuo, S Xiao, TP Russell Advanced Materials 23 (48), 5755, 2011 | 46 | 2011 |
| Phase transition behavior in thin films of block copolymers by use of immiscible solvent vapors B Kim, SW Hong, S Park, J Xu, SK Hong, TP Russell Soft Matter 7 (2), 443-447, 2011 | 34 | 2011 |
| Asymmetric templates for forming non-periodic patterns using directed self-assembly materials GM Schmid, RA Farrell, J Xu, JR Cantone, ME Preil US Patent 8,956,808, 2015 | 32 | 2015 |
| Solvent-assisted directed self-assembly of spherical microdomain block copolymers to high areal density arrays. W Gu, J Xu, JK Kim, SW Hong, X Wei, X Yang, KY Lee, DS Kuo, S Xiao, ... Advanced Materials (Deerfield Beach, Fla.) 25 (27), 3677-3682, 2013 | 28 | 2013 |
| Fabrication of 28nm pitch Si fins with DSA lithography G Schmid, R Farrell, J Xu, C Park, M Preil, V Chakrapani, N Mohanty, ... Alternative Lithographic Technologies V 8680, 310-321, 2013 | 28 | 2013 |
| Exploration of the directed self-assembly based nano-fabrication design space using computational simulations A Latypov, M Preil, G Schmid, J Xu, H Yi, K Yoshimoto, Y Zou Alternative Lithographic Technologies V 8680, 202-212, 2013 | 27 | 2013 |
| Morphological study on an azobenzene-containing liquid crystalline diblock copolymer L Ding, H Mao, J Xu, J He, X Ding, TP Russell Macromolecules 41 (6), 1897-1900, 2008 | 23 | 2008 |
| On the influence of ion incorporation in thin films of block copolymers J He, JY Wang, J Xu, R Tangirala, D Shin, TP Russell, X Li, J Wang Advanced Materials 19 (24), 4370-4374, 2007 | 23 | 2007 |
| Simulations of spatial DSA morphology, DSA-aware assist features and block copolymer-homopolymer blends A Latypov, TH Coskun, G Garner, M Preil, G Schmid, J Xu, Y Zou Alternative Lithographic Technologies VI 9049, 25-34, 2014 | 22 | 2014 |
| Computational simulations and parametric studies for directed self-assembly process development and solution of the inverse directed self-assembly problem A Latypov, G Garner, M Preil, G Schmid, WL Wang, J Xu, Y Zou Japanese Journal of Applied Physics 53 (6S), 06JC01, 2014 | 19 | 2014 |
| Methods for fabricating integrated circuits including formation of chemical guide patterns for directed self-assembly lithography RA Farrell, GM Schmid, X Ji US Patent 8,853,101, 2014 | 17 | 2014 |
| Manufacturability considerations for DSA RA Farrell, ER Hosler, GM Schmid, J Xu, ME Preil, V Rastogi, N Mohanty, ... Advances in Patterning Materials and Processes XXXI 9051, 242-253, 2014 | 16 | 2014 |
| Chemical and physical templates for forming patterns using directed self-assembly materials GM Schmid, RA Farrell, J Xu, JR Cantone, ME Preil US Patent 8,790,522, 2014 | 14 | 2014 |
| Methods for fabricating integrated circuits using designs of integrated circuits adapted to directed self-assembly fabrication to form via and contact structures A Latypov, J Xu US Patent 9,305,834, 2016 | 13 | 2016 |
| Improving SEM image quality using pixel super resolution technique M Lee, J Cantone, J Xu, L Sun, R Kim Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014 | 11 | 2014 |
