Ji Xu
Ji Xu
Motivo, Inc.
Verified email at motivo.ai
Cited by
Cited by
Macroscopic 10-terabit–per–square-inch arrays from block copolymers with lateral order
S Park, DH Lee, J Xu, B Kim, SW Hong, U Jeong, T Xu, TP Russell
Science 323 (5917), 1030-1033, 2009
A simple route to highly oriented and ordered nanoporous block copolymer templates
S Park, JY Wang, B Kim, J Xu, TP Russell
ACS nano 2 (4), 766-772, 2008
Lateral ordering of cylindrical microdomains under solvent vapor
S Park, B Kim, J Xu, T Hofmann, BM Ocko, TP Russell
Macromolecules 42 (4), 1278-1284, 2009
Directed Self‐Assembly of Block Copolymers on Two‐Dimensional Chemical Patterns Fabricated by Electro‐Oxidation Nanolithography
J Xu, S Park, S Wang, TP Russell, BM Ocko, A Checco
Advanced Materials 22 (20), 2268-2272, 2010
Block copolymer self-assembly in chemically patterned squares
J Xu, TP Russell, BM Ocko, A Checco
Soft Matter 7 (8), 3915-3919, 2011
Fabrication of Silicon Oxide Nanodots with an Areal Density Beyond 1 Teradots Inch−2
J Xu, SW Hong, W Gu, KY Lee, DS Kuo, S Xiao, TP Russell
Advanced Materials 23 (48), 5755-5761, 2011
Phase transition behavior in thin films of block copolymers by use of immiscible solvent vapors
B Kim, SW Hong, S Park, J Xu, SK Hong, TP Russell
Soft Matter 7 (2), 443-447, 2011
Asymmetric templates for forming non-periodic patterns using directed self-assembly materials
GM Schmid, RA Farrell, J Xu, JR Cantone, ME Preil
US Patent 8,956,808, 2015
Fabrication of 28nm pitch Si fins with DSA lithography
G Schmid, R Farrell, J Xu, C Park, M Preil, V Chakrapani, N Mohanty, ...
Alternative Lithographic Technologies V 8680, 86801F, 2013
Solvent‐assisted directed self‐assembly of spherical microdomain block copolymers to high areal density arrays
W Gu, J Xu, JK Kim, SW Hong, X Wei, X Yang, KY Lee, DS Kuo, S Xiao, ...
Advanced Materials 25 (27), 3677-3682, 2013
Exploration of the directed self-assembly based nano-fabrication design space using computational simulations
A Latypov, M Preil, G Schmid, J Xu, H Yi, K Yoshimoto, Y Zou
Alternative Lithographic Technologies V 8680, 868013, 2013
On the influence of ion incorporation in thin films of block copolymers
J He, JY Wang, J Xu, R Tangirala, D Shin, TP Russell, X Li, J Wang
Advanced Materials 19 (24), 4370-4374, 2007
Simulations of spatial DSA morphology, DSA-aware assist features and block copolymer-homopolymer blends
A Latypov, TH Coskun, G Garner, M Preil, G Schmid, J Xu, Y Zou
Alternative Lithographic Technologies VI 9049, 904908, 2014
Morphological study on an Azobenzene-containing liquid crystalline Diblock copolymer
L Ding, H Mao, J Xu, J He, X Ding, TP Russell, DR Robello, M Mis
Macromolecules 41 (6), 1897-1900, 2008
Computational simulations and parametric studies for directed self-assembly process development and solution of the inverse directed self-assembly problem
A Latypov, G Garner, M Preil, G Schmid, WL Wang, J Xu, Y Zou
Japanese Journal of Applied Physics 53 (6S), 06JC01, 2014
Methods for fabricating integrated circuits including formation of chemical guide patterns for directed self-assembly lithography
RA Farrell, GM Schmid, X Ji
US Patent 8,853,101, 2014
Manufacturability considerations for DSA
RA Farrell, ER Hosler, GM Schmid, J Xu, ME Preil, V Rastogi, N Mohanty, ...
Advances in Patterning Materials and Processes XXXI 9051, 90510Z, 2014
Chemical and physical templates for forming patterns using directed self-assembly materials
GM Schmid, RA Farrell, J Xu, JR Cantone, ME Preil
US Patent 8,790,522, 2014
UV-enhanced Ordering in Azobenzene-Containing Polystyrene-block-Poly(n-Butyl Methacrylate) Copolymer Blends
W Chen, JY Wang, X Wei, J Xu, AC Balazs, K Matyjaszewski, TP Russell
Macromolecules 44 (2), 278-285, 2011
Design layout analysis and DFM optimization using topological patterns
J Xu, KN Krishnamoorthy, E Teoh, V Dai, L Capodieci, J Sweis, YC Lai
Design-Process-Technology Co-optimization for Manufacturability IX 9427, 94270Q, 2015
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