| Toward new candidates for hydrogen storage: high-surface-area carbon aerogels H Kabbour, TF Baumann, JH Satcher, A Saulnier, CC Ahn Chemistry of Materials 18 (26), 6085-6087, 2006 | 259 | 2006 |
| Self-aligned quadruple patterning integration using spacer on spacer pitch splitting at the resist level for sub-32nm pitch applications A Raley, S Thibaut, N Mohanty, K Subhadeep, S Nakamura, A Ko, ... Advanced Etch Technology for Nanopatterning V 9782, 97820F, 2016 | 35 | 2016 |
| Challenges and mitigation strategies for resist trim etch in resist-mandrel based SAQP integration scheme N Mohanty, E Franke, E Liu, A Raley, J Smith, R Farrell, M Wang, K Ito, ... Advanced Etch Technology for Nanopatterning IV 9428, 94280G, 2015 | 19 | 2015 |
| EPE improvement thru self-alignment VIA multi-color material integration N Mohanty, JT Smith, L Huli, C Pereira, A Raley, S Kal, C Fonseca, X Sun, ... Optical Microlithography XXX 10147, 1014704, 2017 | 14 | 2017 |
| Self-aligned blocking integration demonstration for critical sub-40nm pitch Mx level patterning A Raley, N Mohanty, X Sun, RA Farrell, JT Smith, A Ko, AW Metz, P Biolsi, ... Advanced Etch Technology for Nanopatterning VI 10149, 101490O, 2017 | 14 | 2017 |
| Ultrathin EUV patterning stack using polymer brush as an adhesion promotion layer I Seshadri, A De Silva, L Meli, C Liu, C Chi, J Guo, K Schmidt, H Truang, ... Extreme Ultraviolet (EUV) Lithography VIII 10143, 101431D, 2017 | 9 | 2017 |
| Self-aligned blocking integration demonstration for critical sub-30nm pitch Mx level patterning with EUV self-aligned double patterning A Raley, J Lee, JT Smith, X Sun, RA Farrell, J Shearer, Y Xu, A Ko, ... Advanced Etch Technology for Nanopatterning VII 10589, 105890L, 2018 | 8 | 2018 |
| Self-aligned quadruple patterning using spacer on spacer integration optimization for N5 S Thibaut, A Raley, N Mohanty, S Kal, E Liu, A Ko, D O'Meara, K Tapily, ... Advanced Etch Technology for Nanopatterning VI 10149, 101490I, 2017 | 6 | 2017 |
| Ultrathin extreme ultraviolet patterning stack using polymer brush as an adhesion promotion layer I Seshadri, A De Silva, L Meli, CCC Liu, C Chi, J Guo, HD Truong, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (3), 033506, 2017 | 5 | 2017 |
| A spacer-on-spacer scheme for self-aligned multiple patterning and integration A Raley, S Thibaut, N Mohanty, K Subhadeep, S Nakamura, A Ko, ... | 2* | |
| Multi-color fly-cut-SAQP for reduced process variation RA Farrell, E Franke, K Tapily, J Hotalen, D O'Meara, A Raley, A Ko, ... Advances in Patterning Materials and Processes XXXV 10586, 1058611, 2018 | 1 | 2018 |
| Dry-plasma-free chemical etch technique for variability reduction in multi-patterning (Conference Presentation) S Kal, N Mohanty, RA Farrell, E Franke, A Raley, S Thibaut, C Pereira, ... Advanced Etch Technology for Nanopatterning VI 10149, 101490P, 2017 | 1 | 2017 |
