Kafai Lai
Kafai Lai
IBM Research
Verified email at us.ibm.com
Title
Cited by
Cited by
Year
Optimum mask and source patterns to print a given shape
AE Rosenbluth, SJ Bukofsky, CA Fonseca, MS Hibbs, K Lai, AF Molless, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 1 (1), 13-30, 2002
2572002
Optimum mask and source patterns to print a given shape
AE Rosenbluth, SJ Bukofsky, MS Hibbs, K Lai, AF Molless, RN Singh, ...
Optical Microlithography XIV 4346, 486-502, 2001
1972001
Modeling of stress-induced leakage current in ultrathin oxides with the trap-assisted tunneling mechanism
AI Chou, K Lai, K Kumar, P Chowdhury, JC Lee
Applied physics letters 70 (25), 3407-3409, 1997
1341997
Method of forming sub-lithographic features using directed self-assembly of polymers
J Cheng, K Lai, W Li, YH Na, C Rettner, DP Sanders, D Yang
US Patent 8,114,306, 2012
1022012
Printability verification by progressive modeling accuracy
GM Gallatin, K Lai, M Mukherjee, AE Rosenbluth
US Patent 7,512,927, 2009
782009
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
K Lai, AE Rosenbluth, S Bagheri, J Hoffnagle, K Tian, D Melville, ...
Optical Microlithography XXII 7274, 72740A, 2009
682009
Method for evaluating the effects of multiple exposure processes in lithography
CA Fonseca, SJ Bukofsky, K Lai
US Patent 6,777,147, 2004
672004
Scattered light: the increasing problem for 193-nm exposure tools and beyond
K Lai, CHJ Wu, CJ Progler
Optical Microlithography XIV 4346, 1424-1435, 2001
662001
Intensive optimization of masks and sources for 22nm lithography
AE Rosenbluth, DO Melville, K Tian, S Bagheri, J Tirapu-Azpiroz, K Lai, ...
Optical Microlithography XXII 7274, 727409, 2009
602009
Method for designing optical lithography masks for directed self-assembly
J Cheng, K Lai, W Li, YH Na, JW Pitera, CT Rettner, DP Sanders, D Yang
US Patent 8,336,003, 2012
572012
Extending the range of lithographic simulation integrals
GM Gallatin, E Gofman, K Lai, MA Lavin, M Mukherjee, D Ramm, ...
US Patent 7,010,776, 2006
542006
Pharmaceutical compositions
C Ross
US Patent App. 10/312,200, 2003
512003
Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond
CC Liu, E Franke, Y Mignot, R Xie, CW Yeung, J Zhang, C Chi, C Zhang, ...
Nature Electronics 1 (10), 562-569, 2018
502018
Benefits and trade-offs of global source optimization in optical lithography
K Tian, A Krasnoperova, D Melville, AE Rosenbluth, D Gil, ...
Optical Microlithography XXII 7274, 72740C, 2009
432009
Correlation of dielectric breakdown with hole transport for ultrathin thermal oxides and N2O oxynitrides
MY Hao, WM Chen, K Lai, JC Lee, M Gardner, J Fulford
Applied physics letters 66 (9), 1126-1128, 1995
431995
Directed self-assembly of block copolymers using segmented prepatterns
J Cheng, K Lai, W Li, YH Na, C Rettner, DP Sanders
US Patent 8,398,868, 2013
422013
Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy
CC Liu, J Pitera, N Lafferty, K Lai, C Rettner, M Tjio, N Arellano, J Cheng
Alternative Lithographic Technologies IV 8323, 83230X, 2012
382012
Design and manufacturability tradeoffs in unidirectional and bidirectional standard cell layouts in 14 nm node
K Vaidyanathan, SH Ng, D Morris, N Lafferty, L Liebmann, M Bender, ...
Design for Manufacturability through Design-Process Integration VI 8327, 83270K, 2012
382012
Design of a tunable GaAs/AlGaAs multiple-quantum-well resonant-cavity photodetector
K Lai, JC Campbell
IEEE journal of quantum electronics 30 (1), 108-114, 1994
371994
Method for designing optical lithography masks for directed self-assembly
J Cheng, K Lai, W Li, YH Na, JW Pitera, CT Rettner, DP Sanders, D Yang
US Patent 8,856,693, 2014
322014
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