Chi-Chun Liu
Chi-Chun Liu
IBM Research
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Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries
MP Stoykovich, H Kang, KC Daoulas, G Liu, CC Liu, JJ de Pablo, ...
Acs Nano 1 (3), 168-175, 2007
Chemical patterns for directed self-assembly of lamellae-forming block copolymers with density multiplication of features
CC Liu, A Ramírez-Hernández, E Han, GSW Craig, Y Tada, H Yoshida, ...
Macromolecules 46 (4), 1415-1424, 2013
Perpendicular orientation of domains in cylinder-forming block copolymer thick films by controlled interfacial interactions
E Han, KO Stuen, M Leolukman, CC Liu, PF Nealey, P Gopalan
Macromolecules 42 (13), 4896-4901, 2009
Fabrication of lithographically defined chemically patterned polymer brushes and mats
CC Liu, E Han, MS Onses, CJ Thode, S Ji, P Gopalan, PF Nealey
Macromolecules 44 (7), 1876-1885, 2011
One‐step direct‐patterning template utilizing self‐assembly of POSS‐containing block copolymers
T Hirai, M Leolukman, CC Liu, E Han, YJ Kim, Y Ishida, T Hayakawa, ...
Advanced Materials 21 (43), 4334-4338, 2009
Generalization of the use of random copolymers to control the wetting behavior of block copolymer films
S Ji, CC Liu, JG Son, K Gotrik, GSW Craig, P Gopalan, FJ Himpsel, ...
Macromolecules 41 (23), 9098-9103, 2008
DSA grapho-epitaxy process with etch stop material
JA Abdallah, ME Colburn, SJ Holmes, D Kawamura, C Liu, ...
US Patent 8,859,433, 2014
Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-b-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication
H Tsai, JW Pitera, H Miyazoe, S Bangsaruntip, SU Engelmann, CC Liu, ...
ACS nano 8 (5), 5227-5232, 2014
Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication
S Ji, L Wan, CC Liu, PF Nealey
Progress in Polymer Science 54, 76-127, 2016
Metal nanodot memory by self-assembled block copolymer lift-off
AJ Hong, CC Liu, Y Wang, J Kim, F Xiu, S Ji, J Zou, PF Nealey, KL Wang
Nano letters 10 (1), 224-229, 2010
Molecular transfer printing using block copolymers
S Ji, CC Liu, G Liu, PF Nealey
ACS nano 4 (2), 599-609, 2010
Graphoepitaxial assembly of symmetric block copolymers on weakly preferential substrates
E Han, H Kang, CC Liu, PF Nealey, P Gopalan
Advanced Materials 22 (38), 4325-4329, 2010
Domain Orientation and Grain Coarsening in Cylinder-Forming Poly(styrene-b-methyl methacrylate) Films
S Ji, CC Liu, W Liao, AL Fenske, GSW Craig, PF Nealey
Macromolecules 44 (11), 4291-4300, 2011
Integration of block copolymer directed assembly with 193 immersion lithography
CC Liu, PF Nealey, AK Raub, PJ Hakeem, SRJ Brueck, E Han, P Gopalan
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2010
Plasma etch removal of poly (methyl methacrylate) in block copolymer lithography
YH Ting, SM Park, CC Liu, X Liu, FJ Himpsel, PF Nealey, AE Wendt
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008
An adaptive finite volume method for incompressible heat flow problems in solidification
CW Lan, CC Liu, CM Hsu
Journal of Computational Physics 178 (2), 464-497, 2002
Towards an all-track 300 mm process for directed self-assembly
CC Liu, CJ Thode, PA Rincon Delgadillo, GSW Craig, PF Nealey, ...
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2011
Pattern transfer using poly(styrene-block-methyl methacrylate) copolymer films and reactive ion etching
CC Liu, PF Nealey, YH Ting, AE Wendt
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007
Surface roughening of polystyrene and poly (methyl methacrylate) in Ar/O2 plasma etching
YH Ting, CC Liu, SM Park, H Jiang, PF Nealey, AE Wendt
Polymers 2 (4), 649-663, 2010
Orientation of block copolymer resists on interlayer dielectrics with tunable surface energy
HS Suh, H Kang, CC Liu, PF Nealey, K Char
Macromolecules 43 (1), 461-466, 2010
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