|Graphene-based single-bacterium resolution biodevice and DNA transistor: interfacing graphene derivatives with nanoscale and microscale biocomponents|
N Mohanty, V Berry
Nano letters 8 (12), 4469-4476, 2008
|Biocompatible, robust free‐standing paper composed of a TWEEN/graphene composite|
S Park, N Mohanty, JW Suk, A Nagaraja, J An, RD Piner, W Cai, ...
Advanced Materials 22 (15), 1736-1740, 2010
|Nanotomy-based production of transferable and dispersible graphene nanostructures of controlled shape and size|
N Mohanty, D Moore, Z Xu, TS Sreeprasad, A Nagaraja, AA Rodriguez, ...
Nature communications 3 (1), 1-8, 2012
|Impermeable graphenic encasement of bacteria|
N Mohanty, M Fahrenholtz, A Nagaraja, D Boyle, V Berry
Nano letters 11 (3), 1270-1275, 2011
|High‐throughput, ultrafast synthesis of solution‐dispersed graphene via a facile hydride chemistry|
N Mohanty, A Nagaraja, J Armesto, V Berry
Small 6 (2), 226-231, 2010
|A New Family of Drosophila Balancer Chromosomes With a w− dfd-GMR Yellow Fluorescent Protein Marker|
T Le, Z Liang, H Patel, MH Yu, G Sivasubramaniam, M Slovitt, ...
Genetics 174 (4), 2255-2257, 2006
|Towards electrical testable SOI devices using Directed Self-Assembly for fin formation|
CC Liu, C Estrada-Raygoza, H He, M Cicoria, V Rastogi, N Mohanty, ...
Alternative Lithographic Technologies VI 9049, 904909, 2014
|Covalent Functionalization of Dipole‐Modulating Molecules on Trilayer Graphene: An Avenue for Graphene‐Interfaced Molecular Machines|
P Nguyen, J Li, TS Sreeprasad, K Jasuja, N Mohanty, M Ikenberry, ...
Small 9 (22), 3823-3828, 2013
|Fabrication of 28nm pitch Si fins with DSA lithography|
G Schmid, R Farrell, J Xu, C Park, M Preil, V Chakrapani, N Mohanty, ...
Alternative Lithographic Technologies V 8680, 86801F, 2013
|Extension region for a semiconductor device|
K Tapily, J Smith, N Mohanty, AJ Devilliers
US Patent 10,529,830, 2020
|Organic mandrel protection process|
A Ko, A Raley, S Thibaut, S Nakamura, N Mohanty
US Patent 10,354,873, 2019
|Synthesis and characterization of amphiphilic reduced graphene oxide with epoxidized methyl oleate|
BK Ahn, J Sung, Y Li, N Kim, M Ikenberry, K Hohn, N Mohanty, P Nguyen, ...
Advanced Materials 24 (16), 2123-2129, 2012
|Self-aligned quadruple patterning integration using spacer on spacer pitch splitting at the resist level for sub-32nm pitch applications|
A Raley, S Thibaut, N Mohanty, K Subhadeep, S Nakamura, A Ko, ...
Advanced Etch Technology for Nanopatterning V 9782, 97820F, 2016
|Production of graphene nanoribbons with controlled dimensions and crystallographic orientation|
V Berry, N Mohanty, DS Moore
US Patent 9,272,911, 2016
|Manufacturability considerations for DSA|
RA Farrell, ER Hosler, GM Schmid, J Xu, ME Preil, V Rastogi, N Mohanty, ...
Advances in Patterning Materials and Processes XXXI 9051, 90510Z, 2014
|Fin formation using graphoepitaxy DSA for FinFET device fabrication|
CC Liu, FL Lie, V Rastogi, E Franke, N Mohanty, R Farrell, H Tsai, K Lai, ...
Alternative Lithographic Technologies VII 9423, 94230S, 2015
|Challenges and mitigation strategies for resist trim etch in resist-mandrel based SAQP integration scheme|
N Mohanty, E Franke, E Liu, A Raley, J Smith, R Farrell, M Wang, K Ito, ...
Advanced Etch Technology for Nanopatterning IV 9428, 94280G, 2015
|EPE improvement thru self-alignment via multi-color material integration|
N Mohanty, JT Smith, L Huli, C Pereira, A Raley, S Kal, C Fonseca, X Sun, ...
Optical Microlithography XXX 10147, 1014704, 2017
|Method for directed self-assembly and pattern curing|
US Patent 9,478,435, 2016
|Self-aligned block technology: a step toward further scaling|
F Lazzarino, N Mohanty, Y Feurprier, L Huli, V Luong, M Demand, ...
Advanced Etch Technology for Nanopatterning VI 10149, 1014908, 2017